Peter Kürz studied physics at LMU Munich and obtained a doctorate in experimental physics from the University of Constance. After two years of postdoctoral research at NTT Basic Research Laboratories he joined ZEISS in 1996. Since 1999 he has been working on EUV lithography and is currently responsible for the development and market launch of the next generation of ZEISS EUV optics. In 2006 and 2013 he received the Carl Zeiss Innovation Award for leading-edge technology and was a finalist for the Deutscher Zukunftspreis in 2007. This year he was again nominated for the Deutscher Zukunftspreis.