Following over 20 years of intensive, collaborative development work, European companies and research institutes have created a revolutionary new manufacturing technology for mass-producing powerful micro-chips: EUV lithography. Because EUV light is absorbed even by air, ZEISS SMT created an optical system for the EUV lithography machine that consists of the world’s most precise mirrors with a maximum shape deviation in the range of 0.1 billionth meters enabling future chip generations.

Tags: Digitalisation, Engineering.