Alexander Schafgans

Alexander Schafgans is Sr Vice President, Head of Development & Engineering for High-NA EUV lithography systems at ASML. Since joining ASML/Cymer in 2011 as a Scientist, Alex has played a pivotal role in advancing EUV Source and scanner technology. His work has spanned fundamental research and system-level engineering, contributing significantly to the definition, development, and industrialization of the breakthrough 250W EUV Source for semiconductor manufacturing. He was most recently the Head of D&E at ASML San Diego. He holds BS, MS, and PhD degrees in Physics from the University of California, San Diego.