Following over 20 years of intensive, collaborative development work, European companies and research institutes have created a revolutionary new manufacturing technology for mass-producing powerful micro-chips: EUV lithography. Because EUV light is absorbed even by air, ZEISS SMT created an optical system for the EUV lithography machine that consists of the world’s most precise mirrors with a maximum shape deviation in the range of 0.1 billionth meters enabling future chip generations.

Tags: Digitalisation, Engineering.

Peter Kürz

Carl Zeiss SMT AG

Peter Kürz studied physics at LMU Munich and obtained a doctorate in experimental physics from the University of Constance. After two years of postdoctoral research at NTT Basic Research Laboratories he joined ZEISS in 1996. Since 1999 he has been working on EUV lithography and is currently responsible for the development and market launch of the next generation of ZEISS EUV optics. In 2006 and 2013 he received the Carl Zeiss Innovation Award for leading-edge technology and was a finalist for the Deutscher Zukunftspreis in 2007. This year he was again nominated for the Deutscher Zukunftspreis.

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